| About this Symposium |
| Meeting |
2020 TMS Annual Meeting & Exhibition
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| Symposium
|
Phase Stability, Phase Transformations, and Reactive Phase Formation in Electronic Materials XIX
|
| Sponsorship |
TMS Functional Materials Division
TMS: Alloy Phases Committee
|
| Organizer(s) |
Hiroshi Nishikawa, Osaka University
Shi-Kang Lin, National Cheng Kung University
Chao-Hong Wang, National Chung Cheng University
Chih-Ming Chen, National Chung Hsing University
Jaeho Lee, Hongik University
Zhi-Quan Liu, Shenzhen Institutes of Advanced Technology
Ming-Tzer Lin, National Chung Hsing University
Dajian Li, Karlsruhe Institute of Technology
Yu Zhong, Worcester Polytechnic Institute
Yee-wen Yen, National Taiwan University of Science and Technology
Song-Mao Liang, Clausthal University of Technology
A.S.Md Abdul Haseeb, Bangladesh University of Engineering and Technology (BUET)
Ligang Zhang, Central South University
Sehoon Yoo, Korea Institute of Industrial Technology |
| Scope |
This is the 19th in a series of TMS symposia addressing the stability, transformation, and formation of phases during the fabrication, processing, and utilization of electronic materials and devices. Topics of interests range from microelectronic technologies to advanced energy technologies, including phase stability, transformation, formation, and morphological evolution of electronic packaging materials, interconnection materials, integrated circuit materials, optoelectronic materials as well as energy storage and generating materials. |
| Abstracts Due |
07/15/2019 |
| Proceedings Plan |
Planned: Supplemental Proceedings volume |