| About this Abstract |
| Meeting |
2020 TMS Annual Meeting & Exhibition
|
| Symposium
|
Phase Stability, Phase Transformations, and Reactive Phase Formation in Electronic Materials XIX
|
| Presentation Title |
Revisit the Blech Critical Product: Lattice Strain Induces Electromigration Effect |
| Author(s) |
Kuan-Hsueh Lin, Yu-chen Liu, Shih-kang Lin, Ching-Shun Ku, Shang-Jui Chiu |
| On-Site Speaker (Planned) |
Kuan-Hsueh Lin |
| Abstract Scope |
Electromigration (EM) effect is an atomic diffusion induced by electric currents. The “Blech critical product”, which is the product of current density and length, was proposed as the criteria for EM occurrence, with the back stress model as the mechanism. This criterion works well for strips up to 150 microns. However, in this study, we found the critical product failed to predict the EM occurrence when the strips were 5000 microns long or longer. We characterized the lattice strains of Al strips with various lengths in the range of microns to centimeters with in situ current-stressing synchrotron radiation-based X-ray diffraction and first principles calculations. The results showed that beyond the critical lattice strain, hillocks were formed on all Al strips in spite of lengths, suggesting the correlation between the lattice strain and EM occurrence. The mechanism that governs EM occurrence will be proposed and elaborated in the presentation. |
| Proceedings Inclusion? |
Planned: Supplemental Proceedings volume |