| Abstract Scope |
The ongoing miniaturization in technological devices and the progress in surface science demand novel instrumental methods for surface characterization on a length scale of only a few atomic distances. The combination of a x-ray photoelectron emission microscope (XPEEM) or low-energy electron microscope (LEEM) is a powerful technique for studying the dynamic and static properties of surfaces and thin films including growth and decay, phase transitions, reactions, surface structure and morphology. It utilizes low energy electrons to image surfaces with few nm lateral resolution and atomic layer depth resolution. In the LEEM/XPEEM setup, when using the electron irradiation, the backscattered electrons, Auger and secondary electrons may be used, while photoelectrons, Auger and secondary electrons are utilized for imaging when sample is irradiated with photons. In this talk I will present examples of application of the LEEM/XPEEM technique to the investigations of novel materials, including thin films, adsorbate structures and layered materials. |