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Meeting MS&T22: Materials Science & Technology
Symposium Advances in Emerging Electronic Nanomaterials: Synthesis, Enhanced Properties, Integration, and Applications
Presentation Title Ions in PEALD Processes: from Material Modification to Selective Deposition
Author(s) Christophe Vallee, Marceline Bonvalot
On-Site Speaker (Planned) Christophe Vallee
Abstract Scope Most ALD processes using plasmas only use radicals from the dissociation of O2, NH3, N2 or H2 molecules. Nevertheless, there are other constituents in cold plasma that are regularly used in other processes like ions, photons, or metastable species. In this presentation we will show how by using plasma ions one can not only modify the properties of the deposited materials but also influence the growth kinetics. Controlling the ions and their energy also allows the creation of super-cycles combining ALD and ALE in the same reactor, thus opening the way to new applications such as area and topographical selective deposition.

OTHER PAPERS PLANNED FOR THIS SYMPOSIUM

Applications of Electron Spectro-microscopy to Investigations of Chemistry and Electronic Structure of 2D Materials
Area Selective Atomic Layer Deposition of Silicon Oxide Using an Oxygen Plasma or Ozone with Copper as the Nongrowth Surface
Area Selective Deposition of TaN for Back End of the Line Applications
Correlative Analyses of Low-dimensional Materials
First-Principles Studies of Atomic Layer Deposition
From Atomic-scale Characterization to Atomic-scale Control of Thin Film Deposition Processes
H-1: A Molecular Dynamics Study of Additive Nanomanufacturing: Revealing Sintering Mechanisms
H-2: Optical Engineering of Pbs Colloidal Quantum Dot Solar Cells Via Fabry-Perot Resonance and Distributed Bragg Reflectors
H-4: Study on Nanostructured Molybdenum Carbide for Hydrogen Evolution Reaction
H-5: Toward Scalable Fabrication of Stable Metal Halide Perovskite Solar Cells Through Inkjet Printing and Antisolvent Bathing
How to Achieve State-of-the-art Heterostructures from Polymer-contaminated Graphene?
Hybrid Liquid Metal Nanostructures for Electronics and Energy Applications
Ions in PEALD Processes: from Material Modification to Selective Deposition
Meta-Stable Phase Ferroelectric HfZrO2 Films
Microelectronics Application of Vapor-phase infiltration – Atomic Layer Deposition Derived Organic-Inorganic Hybridization Technique
Molecular Modeling of Atomic Layer Etching
Nanomaterials for Energy-efficient Memory Devices
Nanomolding of Topological Nanowires
Near-Band-Edge Enhancement in Perovskite Solar Cells via Tunable Surface Plasmons
Novel Dirac-source Cold Carrier Injection for Energy-efficient 2D Nanoelectronics
Raman Spectroscopy Studies of Magneto-optical Effects in CrI3
Resolving the Evolution of Atomic Layer Deposited Thin Film Growth by Continuous In Situ X-ray Absorption Spectroscopy
Solution Processible Carbon Precursors for 2D Amorphous Carbon Dielectric
Stable Perovskite Solar Cells
Synthesis and Integration of Transition Metal Dichalcogenides
Synthesis of Atomically Precise Graphene Nanoribbons with Tunable Electronic Properties
Synthesis, Nanofabrication and Characterization of 2D Magnetic Semiconductors for Magnetic Tunnel Junctions
Two Dimensional Materials for Neuromorphic Computing
Unique Molecular Approach to 2D Tin Chalcogenide Materials by Single-Source Precursor Design
Wafer-scale Heterogeneous Integration of Atomically Thin Electronic Materials on Arbitrary Substrates toward Mechanically Reconfigurable Devices

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