About this Abstract |
Meeting |
MS&T22: Materials Science & Technology
|
Symposium
|
Advances in Emerging Electronic Nanomaterials: Synthesis, Enhanced Properties, Integration, and Applications
|
Presentation Title |
Ions in PEALD Processes: from Material Modification to Selective Deposition |
Author(s) |
Christophe Vallee, Marceline Bonvalot |
On-Site Speaker (Planned) |
Christophe Vallee |
Abstract Scope |
Most ALD processes using plasmas only use radicals from the dissociation of O2, NH3, N2 or H2 molecules. Nevertheless, there are other constituents in cold plasma that are regularly used in other processes like ions, photons, or metastable species. In this presentation we will show how by using plasma ions one can not only modify the properties of the deposited materials but also influence the growth kinetics. Controlling the ions and their energy also allows the creation of super-cycles combining ALD and ALE in the same reactor, thus opening the way to new applications such as area and topographical selective deposition. |