| Abstract Scope |
Synchrotron-based x-ray micro and nanobeam techniques have been developed over the past few decades, allowing structural and elemental probing with impressive accuracy and spatial resolution. Such powerful tools have been proved invaluable in many science and technology communities. One of the applications of great interest to both academia and industry is the fundamental understanding of electromigration, a biased atomic diffusion and degradation mechanism in metal interconnects in integrated circuit. Various x-ray microbeam techniques have been used to characterize the detailed mass transport during electromigration, employing diffraction, fluorescence, topography, etc, to allow spatially resolved mapping of strain, alloy composition and microstructure evolution induced by electromigration. This talk will give an overview of the x-ray microbeam techniques and review the progress in the study of electromigration over the past two decades. |