| About this Abstract |
| Meeting |
2024 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advanced Biomaterials for Biomedical Implants
|
| Presentation Title |
Development of Antibacterial Metal Oxide Thin Films for Neurostimulation Applications via Atomic Layer Deposition |
| Author(s) |
Henna Khosla, Shahram Amini, Gang Feng |
| On-Site Speaker (Planned) |
Henna Khosla |
| Abstract Scope |
Atomic layer deposition is a thin-film deposition technique enabling precise control of film thickness and uniformity at the nanoscale. Metal oxide thin films with antibacterial properties can be deposited via ALD. These films can be applied to the surface of neurostimulation electrodes to prevent bacterial colonization and reduce the risk of post-implantation infections. In this work, we report on the development of antibacterial platinum-iridium electrodes using a two-step process. Electrodes are first hierarchically restructured using femtosecond-laser and then atomic layer deposition is used to deposit ultrathin metal oxides of CuO and ZnO on hierarchically restructured electrodes. Structural, chemical, and mechanical properties of film were studied using X-ray diffraction, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, scanning electron microscopy and nanoindentation. The antibacterial properties of the ALD-coated electrodes are also studied, particularly, the killing effect on the two common types of bacteria (E. coli and S. aureus) responsible for implantation infections. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Characterization, Biomaterials, Mechanical Properties |