|About this Abstract
||2021 TMS Annual Meeting & Exhibition
||Characterization of Materials through High Resolution Imaging
||Near-surface Optical Characterisation of Ion Implantation in Titanium Oxide Thin Films
||Eugeniu Balaur, Brian Abbey
|On-Site Speaker (Planned)
Monitoring the dielectric properties of thin films is critical for both electronic applications and integrated circuit production but is often difficult to achieve using conventional imaging techniques. Here we present a new approach using optical coherent diffraction to characterise ion implantation in ultra-thin layers of titanium oxide. Analysis of the data enables us to characterise the doped regions in the films based on their near-surface optical contrast. Using Monte Carlo simulations and the Maxwell-Garnett relation, we are able to quantitatively interpret the observed results in terms of the ion implantation dose.
||Nanotechnology, Thin Films and Interfaces, Surface Modification and Coatings