|About this Abstract
||2021 TMS Annual Meeting & Exhibition
||Characterization of Materials through High Resolution Imaging
||Megahertz X-ray Microscopy for Imaging High-speed Phenomena in Opaque Materials
||Valerio Bellucci, Tokushi Sato, Pablo Villanueva Perez, Jozef Ulicny, Wataru Yashiro, Henry N. Chapman, Adrian Mancuso, Patrik Vagovič
|On-Site Speaker (Planned)
X-ray phase-contrast microscopy with a sampling rate of 1.128 MHz was demonstrated at the European X-ray Free-Electron Laser with micrometre scale spatial resolution. The contrast and spatial resolution attained were superior in comparison to previous synchrotron MHz microscopy due to the high brilliance of the source. This work opens up the possibility of imaging dynamic stochastic phenomena in opaque systems with object velocities up to a few kilometres per second at nanosecond to microsecond time scales by using XFEL sources. Modern emerging technologies, such as additive manufacturing, bioprinting, and new material production, will benefit from this novel metrology tool to probe fundamental high-speed dynamics occurring in such systems. The high brilliance of modern XFEL sources paves the way for future developments of this technology with the introduction of 3D MHz microscopy for volumetric imaging of fast phenomena in opaque samples.