|About this Abstract
||2022 TMS Annual Meeting & Exhibition
||Advanced Functional and Structural Thin Films and Coatings
||Bandgap Emission of Czochralski-silicon Coated with Spin-coated Silica Using Various Catalysis
||Sufian Abedrabbo, El Mostafa Benchafia, Ahmad Al-Qawasmeh, Nuggehalli Ravindra, Anthony Fiory
|On-Site Speaker (Planned)
Spin coating technique is used to deposit silica on ordinary Czochralski silicon using various acidic catalysts. The films are processed to engineer random strain fields that modulate the Si bandgap to enhance the band edge emission. This talk will present a comparative study of erbium doped silica prepared by five different acid catalysts. One set of samples also have ytterbium as co-dopant for erbium for probing upconversion effects on erbium conventional band emission. The erbium doping concentration ranges from 0% to 6% atomic and the films are vacuum annealed at temperatures ranging from 500 °C to 900 °C. The talk will present details of analytical properties of the spin-coated films in addition to a presentation of the optical emission from the Er C-band and from Si bandgap. The effect of the acid catalyst on optical emission and on film properties will be revealed.
||Characterization, Electronic Materials, Thin Films and Interfaces