From mask-based photolithography to mask-less lithography, a variety of techniques has been explored to meet the increasing demand for scalable, customizable, and affordable lithography. However, the currently-available, state-of-the-art methods still require access to expensive tools and facilities. Herein, we present electromagnetic wave modulating fiber-based photolithography platform that provides a direct-write reusable mask, variable features, mark-free alignment, and high-throughput, all packaged in table-top form factor and available at low-cost. The birefringence is implemented in the fiber that allows the ultraviolet that only passes through the fiber to reach the photoresist. Near-field electrospinning is used to produce precisely written micro-fibers to achieve controlled patterning of the photolithography. The suggested novel exposure system based on electromagnetic modulator will be applicable in interdisciplinary fields by leveraging its facile, versatile, scalable, low-cost, compact form factor.