| About this Abstract |
| Meeting |
2024 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advances in Surface Engineering VI
|
| Presentation Title |
Ultralow Wear Plasma-enhanced ALD Nitride Coatings: Linking Film Process-Structure-Property Relationships |
| Author(s) |
Kylie E. Van Meter, Md. Istiaque Chowdury, Mark J Sowa, Alexander C Kozen, Thomas Lockhart, Nicholas C Strandwitz, Brandon A Krick |
| On-Site Speaker (Planned) |
Kylie E. Van Meter |
| Abstract Scope |
Plasma-enhanced atomic layer deposition (PEALD) techniques allow for the creation of thin (~100nm) films with atomic level thickness control at low deposition temperatures. Single atomic layers can be uniformly and conformally grown on non-planar and porous architectures, allowing for applications in silicon-based microelectronics and MEMS/NEMS. Recently developed PEALD multi-metal (TiVN) nitrides have exhibited ultralow wear rates (K < 10-7 mm3/Nm) and low friction (<0.2), as well as low electrical resistivity (~100 µΩ-cm). However, a fundamental understanding of the process-structure-property relationships in PEALD multi-metal nitride films has not been fully developed. This work investigates the effects of varied TiVN film deposition parameters, linking film structure and physical, mechanical, and chemical properties to tribological behavior. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Thin Films and Interfaces, Surface Modification and Coatings, |