About this Symposium |
Meeting |
2021 TMS Annual Meeting & Exhibition
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Symposium
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Computational Techniques for Multi-Scale Modeling in Advanced Manufacturing
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Sponsorship |
TMS Materials Processing and Manufacturing Division TMS Extraction and Processing Division TMS: Computational Materials Science and Engineering Committee TMS: Process Technology and Modeling Committee
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Organizer(s) |
Adrian S. Sabau, Oak Ridge National Laboratory Anthony D. Rollett, Carnegie Mellon University Laurentiu Nastac, University of Alabama Mei Li, Ford Motor Company Alexandra E. Anderson, Gopher Resource Srujan Rokkam, Advanced Cooling Technologies, Inc. |
Scope |
The purpose of the symposium is to present the development of computational techniques for the modeling of multi-scale phenomena in materials processing and advanced manufacturing processes such as additive manufacturing. The submitted papers should address the new application of conventional techniques or new, more efficient, numerical methods and solution algorithms for the solution of problems that involve multiple-scale phenomena. Typical topics may include solution algorithms for coupling of models that describe microscale, mesoscale, and macroscale phenomena, deterministic and stochastic models, phase field simulations, cellular automata, direct numerical simulations of microstructure, mass transport, stress evolution during solidification, and fluid dynamics effects. In addition to theoretical studies, experimental efforts that generate data to validate the models are encouraged; as are applications of these techniques to solve actual complex problems faced by industry in developing new materials and new processes. Topics may pertain to phenomena related to any material or metallurgical processes. |
Abstracts Due |
07/20/2020 |
Proceedings Plan |
Planned: |