| About this Abstract |
| Meeting |
MS&T21: Materials Science & Technology
|
| Symposium
|
Manufacturing and Processing of Advanced Ceramic Materials
|
| Presentation Title |
Progress of Silicon Nitride: Processing, Structure and Property |
| Author(s) |
Tatsuki Ohji, You Zhou , Hiroyuki Miyazaki, Hideki Hyuga , Kiyoshi Hirao |
| On-Site Speaker (Planned) |
Tatsuki Ohji |
| Abstract Scope |
Silicon nitride is one of the most widely used engineering ceramics for a variety of structural applications because of their excellent mechanical and thermal properties. During the last four decades, a great deal of research effort has been devoted for tailoring the microstructures through innovative processing routes and enhancing the properties, leading to tremendous progress of silicon nitride. This paper gives an overview on such progress of silicon nitride, focusing on the processing-structure-property relationship, with some examples of how a unique processing route generates a novel microstructure, which brings enhanced properties in turn. The paper also focuses on the recent developments and applications of silicon nitride ceramics, including high thermal conductivity substrates for next-generation power devices, which are subjected to harsh temperature cycling conditions between -50 and 250ºC and large internal residual stress arising due to thermal expansion mismatch with metal parts, requiring substantial thermal fatigue resistance. |