| About this Abstract |
| Meeting |
MS&T21: Materials Science & Technology
|
| Symposium
|
Manufacturing and Processing of Advanced Ceramic Materials
|
| Presentation Title |
Leveraging Computational Thermodynamics for Guiding SiC-ZrC Chemical Vapor Deposition Process Development |
| Author(s) |
Benjamin Lamm, Jian Peng, Jake McMurray, Dongwon Shin, David Mitchell |
| On-Site Speaker (Planned) |
Benjamin Lamm |
| Abstract Scope |
The codeposition of SiC-ZrC using CVD is of interest for application as high temperature materials. Computational thermodynamics was used to explore the potential CVD processing space with regards to pressure and temperature for a given set of precursor gases. The Zr process gas was generated via chlorination of solid metal pieces. Coupling thermodynamic calculations with experimental CVD can reduce the required number of CVD runs to achieve optimum deposition by refining experimental conditions prior to experimentation. Thermodynamics also offers insight into mechanistic decomposition and deposition behavior, potential for process impurities, and coating properties. A custom thermodynamic database developed at ORNL was used to model the cold-wall CVD process to identify an optimum region of temperature, pressure, and gas precursor ratios for deposition of the desired species. Representative characterization demonstrating the synergy between the model and the coating composition will be presented.Research sponsored by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the US Department of Energy under contract DE-AC05-00OR22725. |