| About this Abstract |
| Meeting |
MS&T21: Materials Science & Technology
|
| Symposium
|
Manufacturing and Processing of Advanced Ceramic Materials
|
| Presentation Title |
Chemical Vapor Deposition of Zirconium-silicon-carbon Compositions |
| Author(s) |
David J. Mitchell, Benjamin Lamm, Michael Lance, Kevin Cooley, Ercan Cakmak, Todd Groff |
| On-Site Speaker (Planned) |
David J. Mitchell |
| Abstract Scope |
Chemical vapor deposition (CVD) was employed to fabricate materials with zirconium, silicon and carbon in the microstructure. CVD enables incorporation of multiple elements into a microstructure by delivering gaseous precursors to a heated substrate surface in the reaction chamber. A cold-wall CVD system was used to deposit coatings onto a graphite susceptor disk, heated via radiofrequency (RF) field. The precursor gas containing zirconium was created via chlorinating metal pieces to form a zirconium chloride gas. The microstructure of the deposited materials was evaluated using metallography and scanning electron microscopy. The chemistry and phases present were investigated via x-ray diffraction and Raman microscopy with chemometric principal component analysis. Analysis shows the CVD processing method was successful in depositing multiphase refractory metal-ceramic materials.Research sponsored by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the US Department of Energy under contract DE-AC05-00OR22725. |