About this Abstract |
Meeting |
2022 TMS Annual Meeting & Exhibition
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Symposium
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Mechanical Response of Materials Investigated Through Novel In-Situ Experiments and Modeling
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Presentation Title |
The Mechanical Behavior of Passivated Al and Al-C Thin Films |
Author(s) |
Hojang Kim, Injong Oh, Gi-Dong Sim |
On-Site Speaker (Planned) |
Hojang Kim |
Abstract Scope |
In this presentation, we report the mechanical behavior of passivated Al and Al-C thin films. Mechanical characterization was carried out by performing tensile tests and membrane deflection tests. The Young’s modulus and the yield strength measured from both methods show similar results. Al thin films containing 4.5 at.% carbon exhibit the yield strength of ~400 MPa, which is significantly larger compared to the yield strength of pure Al thin films (~170 MPa). The mechanical behavior of passivated/unpassivated freestanding Al and Al-C thin films was measured up to a strain range of ~10%. When a thick passivation layer (40 nm) is deposited, a large decrease in the failure strain occurs. However, a large increase in the failure strain can be shown when an ultra-thin passivation layer (< 10 nm) is deposited. The relation between surface roughness and passivation effect will also be discussed. |
Proceedings Inclusion? |
Planned: |
Keywords |
Mechanical Properties, Thin Films and Interfaces, Aluminum |