|About this Abstract
|MS&T23: Materials Science & Technology
|Additive Manufacturing: Design, Materials, Manufacturing, Challenges and Applications
|Atomic Layer Deposition Coatings for Additive Manufacturing Feedstock Modification and Improvement
|Chris Gump, Joseph Gauspohl, Brianna Boeyink, Brandon Castro
|On-Site Speaker (Planned)
We used atomic layer deposition (ALD) to modify the surfaces of additive manufacturing metal powder feedstocks. ALD, long used in the semiconductor industry, utilizes sequential, self-limiting surface reactions to deposit continuous, conformal films on surfaces with sub-nanometer control. Forge Nano has applied this technology to coat powders with a range of nanometer-scale oxide, nitride, and metal films. For metal powders, 2-8 nm Al2O3 ALD films increased the oxidation resistance of the powders, increasing the oxidation onset temperature in thermogravimetric analysis testing by 200-300°C. Sub 3 nm Al2O3 and ZnO coatings improved the flowability of Ti64 and SS316L powders, allowing them to successfully flow through a Hall Flow Funnel test. For materials used in binder jet printing processes, ALD films improved the sintering behavior, yielding increased part density upon burnout. The process has been scaled from 100 g to 100 kg batches, with the potential to scale the processes even further.