|About this Abstract
||MS&T23: Materials Science & Technology
||Advanced Materials for Harsh Environments
||Cold-rolled 3D Graphene Sheets as a Protective Material in the Fluorocarbon Plasma Environment
||Vamsi Krishna Reddy Kondapalli, Kyle Brittingham, Guangqi Zhang, Mahnoosh Khosravifar, Vesselin Shanov
|On-Site Speaker (Planned)
||Vamsi Krishna Reddy Kondapalli
Processing of electronic components in a fluorocarbon plasma environment causes deteriorating corrosion of the dry etch chambers. Ceramics like SiO2 and Al2O3 offer high corrosion resistance and chemical stability. However, their interaction with ionized fluorocarbon gases causes chamber contamination due to erosion and particle generation. Here we propose cold-rolled 3D graphene as an alternative reusable protective material to prevent corrosion of silicon and SiO2 surfaces used in dry etching equipment. 3D graphene (3DG) synthesized via Chemical Vapor Deposition (CVD) is scalable and can be processed into various shapes and sizes. The high surface area and internal porosity of 3DG affect its etch resistance, whereas cold rolling suppresses the porosity and increases the gravimetric density by 37.3 times. Cold-rolled 3DG sheets demonstrated significantly higher etch selectivity to silicon/ SiO2 in comparison to that of pristine 3DG when exposed to a CF4 plasma environment at 100W and 300W power.