Thin films of (AlCoCrNiSi)100-xNx were deposited on silicon wafers using pulsed DC magnetron sputtering technique, with nitrogen gas flow ratios (RN2) of 0, 0.33, and 0.50. The structure and properties of the films were analyzed for elemental composition, surface and cross-sectional morphology, microstructures, roughness, and mechanical properties. Using nanoindentation, the coating deposited at RN2 = 0.50 had the highest hardness (10.7±0.5 GPa) and reduced modulus (176±5 GPa). Microtribology testing was conducted using a 20 μm radius spherical diamond tip under ambient air, applying six loads ranging from 0.5 mN to 9 mN. The worn surfaces were characterized using atomic force microscopy. The coefficient of friction was evaluated to investigate the elastic and plastic behaviors of the coating using Schiffman's model. The coating without nitrogen displayed a predominant plastic behavior during the initial cycles, while the coating deposited at RN2 = 0.33 demonstrated a more elastic behavior, particularly at lower loads.