|About this Abstract
||2021 TMS Annual Meeting & Exhibition
||Materials Processing Fundamentals
||Cylindrical and Planar Magnetron Sputtering for Microstructural Control
||Adie Alwen, Alina Garcia Taormina, A.M. Hodge
|On-Site Speaker (Planned)
This work investigates the influence of target geometry on the resulting plasma gas glow discharge in cylindrical magnetron (hollow cathode) sputtering and its corresponding effects on thin film microstructure during deposition. The impact of elastic and inelastic collisions, magnetic field, and ion motion on plasma distribution are discussed and compared to traditional planar sputtering. Plasma properties were characterized using a Langmuir probe and film microstructure and morphology were observed via characterization techniques including SEM, TEM, and EBSD. By combining these techniques, correlations between plasma distributions and microstructural variations were explored to offer insight into the importance of target geometry on sputtered thin film growth and microstructural features.