| About this Abstract |
| Meeting |
MS&T21: Materials Science & Technology
|
| Symposium
|
Computation Assisted Materials Development for Improved Corrosion Resistance
|
| Presentation Title |
Morphological Stability of Electrostrictive Thin Films |
| Author(s) |
Jin Zhang, Peter Voorhees |
| On-Site Speaker (Planned) |
Jin Zhang |
| Abstract Scope |
A large electric field is typically present in anodic or passive oxide films. Stresses due to lattice misfit are coupled with those induced by the electric field, including Maxwell and electrostrictive stresses. Understanding the electromechanical coupling in thin-film growth is essential for improving corrosion resistance. Here, a model that incorporates the lattice misfit and electric field-induced stresses is developed. We perform a linear stability analysis of the fully coupled model and show that the electrostrictive effect can dominate the stability behavior of thin films, especially under a large electric field. It is shown that the misfit and electrostatic induced morphological instabilities are obtained as the limiting cases of our model, respectively. The effect of material parameters and film thickness on the instability is studied. |