About this Abstract |
Meeting |
2020 TMS Annual Meeting & Exhibition
|
Symposium
|
High Entropy Alloys VIII
|
Presentation Title |
J-89: Effect of Sputtering Parameters on Structure and Mechanical Properties of TiZrHfNiCuCo High Entropy Alloy Films |
Author(s) |
Ki Buem Kim, Young Seok Kim, Taekjip Choi, Jin Kyu Lee, Hyo Soo Lee |
On-Site Speaker (Planned) |
Ki Buem Kim |
Abstract Scope |
The TiZrHfNiCuCo HEA metallic and nitride films on tungsten carbide substrate were successfully developed by a reactive direct current magnetron sputtering. At the low sputtering power, it can be seen that the compositional deviation of the films was clearly observed. With increasing the sputtering power, the films both metallic and nitride were composed of near equi-atomic ratios. Due to the high mixing entropy effect, large atomic radius difference, and rapid quenching effect, the structure of the metallic film revealed amorphous. With the addition of N2, structure of the nitride film was transformed to single FCC structure. The morphology of the metallic and nitride film was revealed as fine columnar structure with nano-scale pore. The atomic distribution of constituent elements of the nitride film was revealed to be nearly homogeneous. The hardness value of 16.6 GPa was obtained in the HEA nitride film. |
Proceedings Inclusion? |
Planned: Supplemental Proceedings volume; Planned: Supplemental Proceedings volume |