About this Abstract |
Meeting |
2025 TMS Annual Meeting & Exhibition
|
Symposium
|
Additive Manufacturing Modeling, Simulation and Machine Learning
|
Presentation Title |
Synchrotron-Based In Situ/Operando Characterization Capabilities at NSLS-II |
Author(s) |
Zhongshu Ren |
On-Site Speaker (Planned) |
Zhongshu Ren |
Abstract Scope |
High-resolution non-intrusive characterization techniques are highly desired for understanding advanced manufacturing processes, which is critical for optimization and improving part qualities. In this presentation, we will introduce a few advanced characterization capabilities at the National Light Source II (NSLS-II) and focus on the Full-field X-ray Imaging (FXI) beamline. FXI provides fast full-field imaging capabilities at tens of nanometers spatial resolution and tens of microsecond temporal resolution based on a transmission X-ray microscope (TXM). This state-of-art TXM facilitates fast tomography scan and full-field x-ray absorption edge spectroscopy (XANES) measurements that provides nano-scale morphology and chemical state information. These advanced capabilities offer reliable and accurate ground-truth validation for scientific computation work of advanced manufacturing processes. |
Proceedings Inclusion? |
Planned: |