About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
Thin Films and Coatings: Properties, Processing and Applications
|
| Presentation Title |
D-28: Investigation of the Effect of Pressure on the Large-Area Patterning of Silicon Using Flexible Mac-Imprint Catalytic Stamp |
| Author(s) |
Garima Bhakuni, Emmanuel Dasinor, Bruno Azeredo |
| On-Site Speaker (Planned) |
Garima Bhakuni |
| Abstract Scope |
The patterning of semiconductors with complex 3D hierarchical structures at sub-100 nm resolution is driving advances in optical metasurfaces for optoelectronic interconnects, hyperspectral imaging, wearable electronics, and augmented reality systems. These structures are now manufacturable through electrochemical Metal-Assisted Chemical Imprinting (Mac-imprint). Recent developments introduce flexible Au-coated PTFE catalytic stamps integrated with pneumatic actuation, enabling conformal micromachining on both planar and curvilinear semiconductor surfaces. Pressure introduces a critical trade-off: insufficient pressure limits catalytic contact, while excessive pressure risks gold delamination or localized stress at substrate edges, compromising pattern fidelity. This work attempts to investigate the optimum pressure that enables high pattern transfer fidelity without delamination. Imprinting is performed on p-type silicon in an HF:H₂O₂:C₂H₅OH solution (ρ = 80%) across 0.2–4.0 psi. Ongoing work includes SEM, optical imaging, and ImageJ-based analysis to quantify etching outcomes and assess gold delamination. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Surface Modification and Coatings, Thin Films and Interfaces, |