About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advances in Magnetism and Magnetic Materials
|
| Presentation Title |
Engineering strong perpendicular magnetic anisotropy in Cu-buffered Co/Pt multilayers grown by moderate vacuum e-beam deposition |
| Author(s) |
Jose Maria Porro, Daniel Domenech, Aritz Villar, Carolina Redondo, Natalia Rio-Lopez, Rafael Morales |
| On-Site Speaker (Planned) |
Jose Maria Porro |
| Abstract Scope |
Perpendicular magnetic anisotropy (PMA) is fundamental for high-density devices. While Co/Pt multilayers with strong PMA are traditionally fabricated by UHV sputtering and numerous repeats, we introduce a more accessible method using e-beam evaporation at moderate vacuum conditions. A Cu buffer layer underlies the success of this method: it induces strong (111) texture in ultrathin [Co/Pt] stacks, enabling loop squareness and tunable coercivity via Cu/Pt thickness adjustment. Polar MOKE microscopy reveals clear domain contrast even for sub nm Co layers, and adding a second repetition compensates for MOKE signal loss while maximizing effective anisotropy. Structural analysis confirms high crystalline quality and consistent texture. MOKE and VSM yield effective anisotropy constants and sharp perpendicular switching comparable to sputtered multilayers. Thermal annealing preserves PMA, reflecting material stability.
These properties align with studies of similar materials grown by sputtering. Moreover, non-conformal e-beam evaporation emerges as a favorable deposition technique in moderate vacuum settings. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Magnetic Materials, |