About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
2026 Technical Division Student Poster Contest
|
| Presentation Title |
SPU-27: Monitoring Progress of MAX to MXene Etching Using a Hydrogen Gas Sensor |
| Author(s) |
Pratyush Chettri, Krutarth Kiran Kamath, Brian Cecil Wyatt, Anupma Thakur, Nithin Chandran B.S., Babak Anasori |
| On-Site Speaker (Planned) |
Pratyush Chettri |
| Abstract Scope |
MXenes are a promising family of two-dimensional transition metal carbides and nitrides with high electrical conductivity and composition-dependent properties, with applications including energy storage, catalysis, and electromagnetic shielding. They are typically synthesized through a top-down etching process from parent MAX phases using Lewis acid-base chemistry, most commonly hydrofluoric acid. High-quality single-to-few layers MXene flakes are obtained under optimal etching conditions, where both under-etching (lower yield) and over-etching (increased defects) are undesirable. The starting MAX composition and grain size, etchant chemistry and composition, and reaction conditions control the etching kinetics. Here, we develop an in-situ monitoring system that tracks the progress of MAX etching by measuring hydrogen gas evolution rates. We successfully generate real-time estimates of reaction completion for Ti3AlC2 MAX etching. This setup provides a rapid, inexpensive, and noninvasive method to monitor the progress of MAX etching, with potential applications across various MAX compositions. |
| Proceedings Inclusion? |
Undecided |
| Keywords |
Nanotechnology, Process Technology, |