About this Abstract |
| Meeting |
MS&T25: Materials Science & Technology
|
| Symposium
|
Grain Boundaries, Interfaces, and Surfaces: Fundamental Structure-Property-Performance Relationships
|
| Presentation Title |
Developments in XPS Surface Analysis: Femtosecond Laser Ablation Depth Profiling |
| Author(s) |
James Lallo, Tim Nunney, Richard White, Mark Baker |
| On-Site Speaker (Planned) |
James Lallo |
| Abstract Scope |
X-ray Photoelectron Spectroscopy [XPS] depth profiling is a widely employed analytical technique to determine the chemical composition of thin films, coatings and interfaces of multi-layered structures, due to its ease of quantification, good sensitivity and chemical state information. However, many organic and inorganic materials suffer from ion beam damage, resulting in incorrect chemical compositions to be recorded during the depth profile. A prototype XPS depth profiling instrument has been constructed that employs a femtosecond laser rather than an ion beam for XPS depth profiling purposes. This novel technique has shown the capability of eradicating chemical damage during XPS depth profiling for all initial inorganic, compound semiconductor and organic materials examined. The technique is also capable of profiling to much greater depths and is much faster than traditional ion beam sputter depth profiling. fs-LA XPS depth profile results will be shown for selected thin films, coatings, multilayer interfaces and oxidized surfaces. |