About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
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| Symposium
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Fundamental Science of Microstructural Evolution and Phase Transformations: An MPMD/FMD/SMD Symposium in Honor of Peter Voorhees
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| Presentation Title |
Applications of Phase-field Method to Microstructural Evolution Problems in Semiconductor Devices for Integrated Circuits |
| Author(s) |
Dongmyung Jung, Jinwoo Oh, Hyesu Gim, Muhammad Hassaan Ali, Hwanwook Lee, Daeun Choi, Yongwoo Kwon |
| On-Site Speaker (Planned) |
Yongwoo Kwon |
| Abstract Scope |
The phase-field method (PFM) is a robust mesoscale computational framework for simulating microstructural evolution in materials such as solidification, phase separation, grain growth, and related processes. We have applied the PFM to study the formation of thin-film microstructures during processing and the device-level behaviors of emerging memory devices. For thin-film microstructures, our model numerically solves a set of differential equations describing gas transport, amorphous film formation, crystallization, and grain growth with stochastic nucleation, all implemented in our in-house C++ code. For memory device simulations, macroscale electro-thermal and mesoscale phase-field equations are solved in a fully coupled manner using COMSOL Multiphysics. This presentation will provide a comprehensive overview of the developed modeling approaches, along with our recent achievements. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Modeling and Simulation, Thin Films and Interfaces, Electronic Materials |