| Abstract Scope |
Fe2VAl Heusler alloys have been widely investigated [1]. Recently, very high performance has been reported in the n-type Fe2V0.8W0.2Al thin films [2]. We have aimed at developing high-performance p-type Heusler thin-films by magnetron sputtering. We chose Fe2V0.8Mn0.2Al for the target material, as the composition was confirmed to be p-type [3]. Moreover, its ferromagnetic nature can be relevant in enhancing power factor [4]. We observed a high p-type power-factor 4.3 mW/K2m for the sample deposited on LaAlO3 substrates [5]. The origin of the high performance will be discussed based on the thin-film microstructure, strain, and magnetic enhancement.
[1] Nishino et al., PRL 79, 1909 (1997)., JAP 115, 123707 (2014). [2] Hinterleitner et al., Nature 576, 85 (2019). [3] J. Mater. Chem. C 12, 8861 (2024). [4] Sci. Adv. 5, eaat5935 (2019)., Mater. Today Phys. 48, 101568 (2024). [5] Sci Tech Adv Mater 26, 2512705 (2025). |