About this Abstract |
| Meeting |
2027 TMS Annual Meeting & Exhibition
|
| Symposium
|
2D Materials – Preparation, Properties, Modeling & Applications
|
| Presentation Title |
Versatile UV Laser Processing for Scalable Fabrication of 2D Thin‑Film Transistors and Laser‑Induced Graphene Devices |
| Author(s) |
Roman Kouskov, Raj Shrestha, Attila Rektor, Hailey Burgoyne, Michael Curtis, Tony Varghese, Dave Estrada |
| On-Site Speaker (Planned) |
Roman Kouskov |
| Abstract Scope |
This project investigates ultraviolet (UV) laser–material interactions using a commercially available 355 nm laser to develop scalable, low‑cost fabrication methods for wafer-scale 2D materials thin‑film transistors (TFTs), and laser‑induced graphene (LIG) structures. Laser processing parameters—including power, scan speed, pulse frequency, and exposure strategy—are optimized to pattern high‑resolution transistor geometries via maskless direct‑write photolithography, enabling rapid prototyping of devices based on MOCVD‑grown wafer‑scale TMD films. In parallel, ultrathin LIG is produced for flexible electronics and wearable sensing. Fabricated features are evaluated for linewidth, fidelity, repeatability, and laser–material interaction regimes, establishing process limits and guiding optimization across both approaches. By integrating direct‑write UV lithography with laser‑induced material modification, this work demonstrates the versatility of low-cost commercially accessible UV laser systems for semiconductor process development, 2D materials device fabrication, flexible sensors, and rapid prototyping of next‑generation microscale electronics. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Additive Manufacturing, Electronic Materials, Thin Films and Interfaces |