About this Abstract |
| Meeting |
MS&T25: Materials Science & Technology
|
| Symposium
|
2025 Undergraduate Student Poster Contest
|
| Presentation Title |
SPU-36: Role of Annealing in Improving the Quality of PMMA-Transferred Monolayer MoS₂ |
| Author(s) |
Pavan Kumar Reddy Pothula, Chen Chen, Rohini Sanikop, Joan Redwing |
| On-Site Speaker (Planned) |
Pavan Kumar Reddy Pothula |
| Abstract Scope |
MoS₂ is a key material in the development of 2D devices due to its electronic and structural properties. However, its integration into real-world devices requires transferring it from its growth substrate to device platforms, a step that often introduces defects/contaminants. This study applies a polymer-assisted transfer method that avoids mechanical and etching damage but leaves PMMA residue. To improve film quality, we investigated the role of annealing. After acetone cleaning, films annealed at 300–400°C under 10 torr in Ar exhibited significant residue removal with minimal observable mechanical degradation. Further work will involve refining the process under high vacuum with varied durations. |