| Abstract Scope |
High-speed, nanoscale 3D printing has the potential to transform manufacturing and enable the fabrication of products that are currently inaccessible. Unfortunately, contemporary nanoscale additive manufacturing techniques fall well short of the throughput, resolution, and yield requirements of potential applications. Therefore, it is critical to devise new methods for low-cost, high-volume, 3D printing of precise nanoscale structures. This talk will present some recent work on the development of the Holographic Metasurface Nanolithography (HMNL) process that allows an entire 3D multi-material nanostructure to be formed in a single shot of light. The HMNL process uses sub-wavelength-patterned metasurface masks (metamasks) to create multi-colored holograms in wavelength selective photocurable hybrid resins to produce nanoscale, 3D, multi-material structures in seconds and thus break the conventional tradeoff between resolution and throughput in nanoscale 3D printing. |