About this Abstract |
| Meeting |
2023 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advanced Functional and Structural Thin Films and Coatings & Honorary Palkowski Session
|
| Presentation Title |
Localized Surface Plasmon Resonance in Highly Doped Si Nanocrystals Embedded in a Silica Matrix |
| Author(s) |
Herve Rinnert, Clavel Berclis Kengne Choumele, Mathieu Stoffel, Xavier Devaux, Etienne Talbot, Jean-Marie Poumirol, Michel Vergnat, Caroline Bonafos, Alix Valdenaire |
| On-Site Speaker (Planned) |
Herve Rinnert |
| Abstract Scope |
Due to their potential use in a wide range of applications such as nanophotonics, light harvesting, sensing, photothermal therapies, nanocrystals (NCs) exhibiting localized surface plasmon resonance have induced a strong research activity. Highly doped semiconductors NCs have recently gained a significant attention because the LSPR frequency is expected to be tuned by controlling the free carrier concentration and to be redshifted as compared to metals. As a low cost, non-toxic and CMOS compatible material, silicon has emerged as a promising material for plasmonic application. Here, highly phosphorus-doped Si-NCs were obtained by elaboration of phosphorus-doped SiO/SiO2 multilayers. Samples were studied at the nanoscale by scanning transmission electron microscopy and atom probe tomography. Depending on the P content, a tunable plasmon-related absorption is obtained. Using a core-shell structure to model doped Si-NCs in a SiO2 environment, the plasmonic response is well described by the Drude theory and free carriers concentrations were determined. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Thin Films and Interfaces, Nanotechnology, Other |