About this Abstract |
| Meeting |
2026 Annual International Solid Freeform Fabrication Symposium (SFF Symp 2026)
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| Symposium
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2026 Annual International Solid Freeform Fabrication Symposium (SFF Symp 2026)
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| Presentation Title |
Spatially Modulated Intensity Masks for Thermal Homogenization in Microscale Selective Laser Sintering (μ-SLS) |
| Author(s) |
Farzana Tasnim, David Shui, Pratik Koirala, Michael Cullinan |
| On-Site Speaker (Planned) |
Farzana Tasnim |
| Abstract Scope |
Microscale selective laser sintering (µ-SLS) of copper nanoparticles suffers from non-uniform densification driven by two simultaneous mechanisms: a hardware-induced optical asymmetry in the Digital Micromirror Device (DMD) projection system and thermally driven edge losses caused by lateral heat dissipation through the glass substrate. Conventional flat-field and binary exposure masks cannot compensate for either effect, resulting in central overheating and under-sintered boundaries. This work presents a multiple-stage computational pipeline that integrates DMD optical field characterization, reduced-order finite-difference thermal modeling, and linear programming optimization to generate spatially tailored inverse-vignette composite masks under 8-bit DMD constraints. Transient finite element simulations validate thermal homogenization predictions prior to physical sintering. Experimental evaluation using spatially resolved four-point probe resistance mapping and SEM characterization demonstrated reduced thermal gradients, improved electrical uniformity, and more consistent microstructural development across sintered features. These results establish a computationally tractable framework for deterministic spatial process control in µ-SLS and advance the adoption of additive manufacturing for semiconductor packaging applications. |
| Proceedings Inclusion? |
Undecided |