About this Abstract |
| Meeting |
MS&T25: Materials Science & Technology
|
| Symposium
|
Additive Manufacturing of Ceramic-Based Materials: Process Development, Materials, Process Optimization and Applications
|
| Presentation Title |
Atomic Layer Deposition (ALD) for Nanoscale SiC AM Feedstock Improvement |
| Author(s) |
Chris Gump, Guillermo Rojas, Dane Lindblad, Casey Christopher, Tommy Martin |
| On-Site Speaker (Planned) |
Chris Gump |
| Abstract Scope |
Forge Nano has used ALD to modify SiC AM feedstock surfaces. ALD uses self-limiting surface reactions to deposit nanoscale films onto surfaces with subnanometer precision. Previously coated Ti64 and AlSi10Mg AM feedstocks demonstrated that ALD films increased feedstock oxidation resistance and flowability, and improved mechanical properties printed parts.100 g batches of SiC were coated with 1 – 3 nm of SiO2 in our research fluidized bed reactor. ICP and Leco C and O elemental analysis proved ineffective at characterizing the films, but FIB/STEM imaging and EDS elemental mapping showed uniformly coated particles, with film thickness scaling with the number of ALD cycles performed. The deposition process was scaled to 3 kg batches in our pilot reactor. We expect this material to exhibit improved flowability, densification and mechanical properties in binder jet and other similar AM applications. Further scaling to 100-300 kg will be discussed in various deposition tools. |