About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
Aluminum Reduction Technology
|
| Presentation Title |
Stability Analysis of a 330 kA Cell retrofitted to Operate at 350 kA using MHD-Valdis Software |
| Author(s) |
Pengfei Du, Marc Dupuis, Hongwu Hu, Wei Liu, Xuan Wang, Jinlong Hou, Kangjian Sun |
| On-Site Speaker (Planned) |
Marc Dupuis |
| Abstract Scope |
This paper presents a stability analysis study of a 330 kA cell retrofitted to operate at 350 kA using the MHD-Valdis software.
An MHD-Valdis model was previously built using the busbar and potshell geometry defined in the SAMI magnetic model presented in a previous TMS paper. It was previously demonstrated that both the magnetic field and the horizontal metal pad current density calculated by MHD-Valdis correspond very well to those previously calculated by SAMI in that previous TMS paper.
A base case non-linear transient cell stability analysis performed using the MHD-Valdis was also previously presented. That base case cell stability analysis study was extended in the present work to include studying the impact or changing ACD, changing metal pad thickness and replacing an anode in the center of the cell and replacing an anode in a one of the cell corners. |
| Proceedings Inclusion? |
Planned: Light Metals |
| Keywords |
Aluminum, Other, |