About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
Advanced Characterization Techniques for Quantifying and Modeling Deformation
|
| Presentation Title |
High-Resolution, Correlative 4D STEM Orientation Analysis with STEMx OIM and DigitalMicrograph |
| Author(s) |
Fernando Cuauhtli Castro |
| On-Site Speaker (Planned) |
Fernando Cuauhtli Castro |
| Abstract Scope |
4D STEM methods can acquire sub-nanometer resolution diffraction data for use in high-resolution orientation and phase mapping of deformed materials. However, the 4D STEM orientation analysis is typically done via open-source scripting packages, which can be a challenge for many scientists. This abstract introduces STEMx OIM - a new package in the familiar DigitalMicrograph software - which enables high-resolution 4D STEM orientation and phase analysis without the need for scripting or additional hardware.
STEMx OIM uses a template matching approach for indexing and calculating orientation and phase maps directly in DigitalMicrograph. The orientation results are easily correlated with chemical information via EDS or EELS data acquired with Gatan hardware. Moreover, orientation mapping can be applied to advanced methods like <i>in-situ</i> 4D STEM or precession-assisted 4D STEM data acquisition with DigitalMicrograph.
High-resolution, correlative orientation analysis of deformed materials should be more widely accessible with the introduction of STEMx OIM. |
| Proceedings Inclusion? |
Planned: |