About this Abstract |
| Meeting |
2027 TMS Annual Meeting & Exhibition
|
| Symposium
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Phase Stability, Phase Transformations, and Reactive Phase Formation in Electronic Materials XXVI
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| Presentation Title |
Phase diagrams and interfacial reactions of Co-Ni-Ge ternary system |
| Author(s) |
Man-Hua Lee, Yung-Chun Tsai, Cheng-Hsi Ho, Sinn-wen Chen |
| On-Site Speaker (Planned) |
Yung-Chun Tsai |
| Abstract Scope |
The Co-Ni-Ge ternary system is an important material system with promising thermoelectric and electronic applications. This study determines the phase equilibria isothermal sections at 800 °C and 600 °C to provide fundamental materials information. Furthermore, the interfacial reactions between CoGe and Ni at 600 °C and 500 °C were investigated. Two continuous solid-solution phases, (Co,Ni)₅Ge₃ and (α-Co,Ni), exist at both 800 °C and 600 °C. The Ni3Ge phase exhibits significant Co solubility. CoGe and NiGe also exhibit significant mutual solubilities, but they do not form a continuous solid solution. The reaction path of the Ni/CoGe diffusion couples reacted at both 600 °C and 500 °C is Ni/Ni₃Ge/ (Co,Ni)₅Ge₃/ CoGe, and the dominating diffusion species is Ge. The reaction rates decrease significantly with decreasing temperature. The thickness of the reaction layer is only 1 μm after reaction at 300 °C for 50 days. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Electronic Materials, Copper / Nickel / Cobalt, Other |