About this Abstract |
| Meeting |
MS&T25: Materials Science & Technology
|
| Symposium
|
Nanotechnology for Energy, Environment, Electronics, Healthcare and Industry
|
| Presentation Title |
Surface Modification of Nanoclay using Low Plasma Irradiation for Environmental Remediation |
| Author(s) |
Paulo Henrique Camani, Sushrisangita Sahoo, Abhinav Yadav, Derval S. Rosa, Lucia Helena Innocentini Mei, Vijaya Kumar Rangari |
| On-Site Speaker (Planned) |
Paulo Henrique Camani |
| Abstract Scope |
Low temperature plasma irradiation was employed to modify the surface of montmorillonite organo-clay (C20A). Sulfur hexafluoride (SF₆) was used as the plasma processing gas, and exposed for 5, 17, and 30 minutes. A slight increase in oxygen-containing functional groups and d-spacing was observed from FTIR and XRD, respectively. Fluorine functional groups were detected on the nanoclay surface with increasing plasma exposure times by XPS spectra. Furthermore, plasma treatment increased the surface area and pore volume, while also decreasing the pore size. The fluorine groups and the enhanced surface area (17 minutes of plasma exposure) significantly improved the adsorption efficiency for hexavalent chromium (Cr(VI)), achieving a removal rate of 45.5% under conditions of pH 4, dosage of 1 g/L, and initial Cr(VI) concentration of ~0.05 mM. These findings demonstrate that plasma modification effectively alters the surface chemistry and textural properties of nanoclays, thereby enhancing their performance in environmental remediation applications. |