About this Abstract |
| Meeting |
2026 TMS Annual Meeting & Exhibition
|
| Symposium
|
Nanostructured Materials in Extreme Environments IV
|
| Presentation Title |
Ion Irradiation Induced Diamond Graphitization: An Evaluation of the Efficiency of Different Ion Species |
| Author(s) |
Alexandros Spyromilios, Peter Hosemann |
| On-Site Speaker (Planned) |
Alexandros Spyromilios |
| Abstract Scope |
Diamond shows promise as a useful material in semiconductor technology due to extraordinary material properties. Fabricating and integrating diamond in semiconductor and other industries requires effective and precise means of material removal, principally a result of graphitization followed by secondary material removal mechanisms. Ion irradiation can be used for subsurface amorphization and graphitization, often using inert species like Helium to achieve this result. This study will examine the graphitization efficiency of unconventional ion species such as transition metals. The graphitization threshold dose will be measured and insight to the fundamental mechanisms that drive amorphization and graphitization will be gained. |
| Proceedings Inclusion? |
Planned: |
| Keywords |
Thin Films and Interfaces, Nanotechnology, Phase Transformations |