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Meeting

2026 TMS Annual Meeting & Exhibition

Symposium

Late News Poster Session

Presentation Title

F-59: Advancing Metal Microfabrication: Silver Nanocluster Resin Engineering for Two-Photon Lithography

Author(s)

Prince Alvin Fofanah, Samantha Cheung , Daniel Delghandi, Wendy Gu

On-Site Speaker (Planned)

Prince Alvin Fofanah

Abstract Scope

Transistors are central to modern electronics, and Two-Photon Lithography (2PL) offers a pathway for fabricating miniaturized, high-resolution components. Current metal 2PL approaches are constrained to 2D structures or slow scanning speeds, limiting scalability. Here, we develop novel silver-based photoresins using AgNO3 precursors and an Ag28Pt nanocluster photosensitizer to achieve direct 3D printing of highly conductive metallic microstructures. Upon 800nm NIR two-photon absorption, Ag+ ions undergo in situ reduction, nucleating and aggregating into metallic silver. Qualitative results demonstrate strong solvent and additive-dependent printing behavior. DMF solvents produced the most stable, high-resolution structures. Significantly, DMF–glycerol formulations suppressed bubbling and enabled the formation of freestanding metallic pillars at high speeds (5000um/s). Post-print analysis revealed a porous microstructure, highlighting the crucial role of nucleation environments in print fidelity. These findings demonstrate the potential of tailored silver photoresins for high-speed, fully 3D-printed metallic architectures, significantly advancing the scalability of 2PL for future microelectronics manufacturing.

Proceedings Inclusion?

Undecided

Keywords

Additive Manufacturing, Nanotechnology, Characterization

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