Advanced Functional and Structural Thin Films and Coatings & Honorary Palkowski Session: Thin Films and Nanostructures for Optoelectronics II
Sponsored by: TMS Functional Materials Division, TMS: Thin Films and Interfaces Committee
Program Organizers: Gerald Ferblantier, University of Strasbourg - IUT LP / ICube Laboratory - CNRS; Adele Carrado, University of Strasbourg; Ramana Chintalapalle, University of Texas at El Paso; Karine Mougin, Cnrs, Is2m; Ravindra Nuggehalli, New Jersey Institute of Technology; Heinz Palkowski, Clausthal University of Technology

Tuesday 2:30 PM
March 21, 2023
Room: Aqua E
Location: Hilton

Session Chair: Karine Mougin, CNRS, IS2M; Ramana Chintalapalle, University of Texas at El Paso


2:30 PM Introductory Comments

2:35 PM  Keynote
Plasma Polymerization: Thin Films and Nanostructures: Jamerson Carneiro De Oliveira1; Aissam Airoudj1; Florence Bally-Le Gall1; Vincent Roucoules2; 1Université de Haute-Alsace, Université de Strasbourg, CNRS, IS2M ; 2Université de Haute-Alsace, Université de Strasbourg, CNRS, IS2M
    Plasma polymerization is a process in which organic plasma species can assemble into diverse substrates, commonly rendering the deposition of functional thin films. That phenomenon can be exploited to modify surfaces in a direct and technologically simple process. Several scientific interests arise from plasma polymerization, with the most commons being the understanding of phenomena in the plasma phase and of the properties of the polymer films. The latter can be additionally tailored by chemical post-functionalization, multi-layers or co-polymerization. Apart from those thematics, one that is underexplored is the nucleation and growth process of those plasma polymers. That commonly comprises spontaneous formation of nanostructures at early stages of the deposition process. Understanding the latter open ups for significant technological and scientific breakthroughs on processing and applications of plasma polymers. The most relevant aspects of formation and applications of plasma polymers thin films and nanostructures are explored in this work.

3:15 PM  Cancelled
Investigation of n- and p-doped Silicon-rich Silicon Oxynitride Thin Films Prepared by ECR-PECVD to Synthesize Doped Silicon Nanocrystals: Gerald Ferblantier1; Emilie Steveler1; Corine Ulhaq-Bouillet2; Dominique Muller1; Yann Le Gall1; 1University of Strasbourg, ICube Laboratory-CNRS; 2University of Strasbourg, IPCMS-CNRS
    

3:45 PM  Invited
Localized Surface Plasmon Resonance in Highly Doped Si Nanocrystals Embedded in a Silica Matrix: Herve Rinnert1; Clavel Berclis Kengne Choumele1; Mathieu Stoffel1; Xavier Devaux1; Etienne Talbot2; Jean-Marie Poumirol3; Michel Vergnat1; Caroline Bonafos3; Alix Valdenaire1; 1Universite de Lorraine - Institut Jean Lamour; 2Normandie Univ., Groupe de Physique des Matériaux; 3CEMES-CNRS
    Due to their potential use in a wide range of applications such as nanophotonics, light harvesting, sensing, photothermal therapies, nanocrystals (NCs) exhibiting localized surface plasmon resonance have induced a strong research activity. Highly doped semiconductors NCs have recently gained a significant attention because the LSPR frequency is expected to be tuned by controlling the free carrier concentration and to be redshifted as compared to metals. As a low cost, non-toxic and CMOS compatible material, silicon has emerged as a promising material for plasmonic application. Here, highly phosphorus-doped Si-NCs were obtained by elaboration of phosphorus-doped SiO/SiO2 multilayers. Samples were studied at the nanoscale by scanning transmission electron microscopy and atom probe tomography. Depending on the P content, a tunable plasmon-related absorption is obtained. Using a core-shell structure to model doped Si-NCs in a SiO2 environment, the plasmonic response is well described by the Drude theory and free carriers concentrations were determined.

4:15 PM Break

4:35 PM  
Electrodeposition of Nickel Oxides Nano Thin Films on 3-D Porous Nickel for Ultracapacitor Application: Balwant Singh1; Debabrata Das1; C Ramana1; 1The University of Texas at El Paso
    The development of low-cost, adaptable strategies and materials to satisfy the needs of energy storage and conversion technologies, particularly for batteries and supercapacitors, are challenging. On the other hand, such materials and designated approaches are desirable in order achieve enhanced device performances in batteries and supercapacitors. In present work, we deposited three-dimensional (3-D) mesoporous nickel-based nickel oxide nanostructures thin films with improved performance for supercapacitor applications. The conformal deposition of nickel oxide nanoflakes on 3-D mesoporous nickel improves the performance of supercapacitor by increasing electrochemical surface area and ease the electron transport through interconnected nickel network. The 3-D mesoporous nickel/nickel oxide nanoflakes exhibits excellent electrochemical performance; exhibit areal capacitance of 720 mFcm−2, energy density of 4 µWhcm−2, power density of 2.5 mW cm−2 and capacitance retention of 82% after 3000 cycles.

4:55 PM  
3D Microstructuration by Direct Laser Writing: Xingyu Wu1; Quentin Bauerlin1; Sébastien Dominici1; Karine Mougin1; Arnaud Spangenberg1; 1Université de Haute-Alsace, CNRS, IS2M; Université de Strasbourg
    Direct laser writing (DLW) based on two photon polymerization has emerged as a very popular 3D microfabrication method since it can be seen as an extension of 3D printer at the micro and nanoscale. Moreover, this technology has proven its unrivalled ability to sculpt the matters at the nanoscale. On the other hand, 4D printing concept appears in 2013 with the idea to facilitate the assembling of macroscopic objects. Nowadays, the fourth dimension refers not only to the ability for material objects to change form after they are produced, but also to their ability to change function after they are printed. Even if several groups have shown the possibility to employ functional material to bring this 4th dimension in their microstructure, the specific condition of photopolymerization in DLW limits the direct integration of stimuli-responsive material. Different alternatives will be discussed such as the use of living polymerization to reconfigure the surface properties of the generated microstructures.

5:15 PM  
Alloying Refractory Diboride Thin Films as a Route to Nanocrystallinity: Samyukta Shrivastav1; Dana Yun1; Kinsey Canova1; John Abelson1; Jessica Krogstad1; 1University of Illinois at Urbana-Champaign
    Hafnium diboride can be deposited as a continuous, conformal amorphous thin film via low temperature chemical vapor deposition (CVD). However, substantiative shrinkage accompanies any excursions to elevated temperatures as a result of crystallization. The ensuing crack formation and spallation negates most functional properties of the refractory coatings. In the present study, we have leveraged the same low temperature CVD methods to fabricated alloyed hafnium diboride films, wherein the degree of crystallinity of as-deposited films increases with increasing concentration of the alloying element. We report on the thermal stability of this nanocrystalline microstructure as well as its impact on the mechanical properties and environmental tolerance of the films. The low temperature, environmentally benign CVD process, when combined with the uniquely nanocrystalline microstructure of the resulting films makes this a highly promising avenue for tailoring the properties of next generation, high performance tool coatings.

5:35 PM Concluding Comments