|About this Abstract
||2017 TMS Annual Meeting & Exhibition
||Phase Stability, Phase Transformations, and Reactive Phase Formation in Electronic Materials XVI
||Ab Initio Critical Product of Blech Distance and Current Density
||Yu-chen Liu, Shih-kang Lin
|On-Site Speaker (Planned)
Blech distance generally elucidated the occurrence of electromigration (EM) effect in terms of plastic deformation. However, no existing model had approached the EM occurrence from elastic deformation, and thus correlating the mechanical properties of materials and EM effect. In this work, we combined in situ synchrotron radiation XRD current experiment and ab initio calculation to reveal the critical point of EM occurrence in terms of mechanical point of view. Under electric current, metals would first undergo elastic tensile deformation at both anode and cathode side. The tensile strain would be originated from electron flow as revealed by ab initio calculation. The strain gradient for atomic diffusion under electric current agreed very much well with the ones obtained from literature. New approach to the Blech critical length-current density product from elastic deformation is derived. This combinatorial study provided novel insights on the correlation of the mechanical property and EM occurrence.
||Planned: Supplemental Proceedings volume