|About this Abstract
||2017 TMS Annual Meeting & Exhibition
||Solar Cell Silicon
||Electrodeposition of Solar Grade Silicon on Graphite in Molten CaCl2
||Huayi Yin, Allen Bard, Donald Sadoway
|On-Site Speaker (Planned)
A dense p-type photoresponsive Si film was electro-chemically deposited on a graphite foil in molten CaCl2 containing 0.15 wt% nano-SiO2 particles. By tuning the cell voltage and/or current density of electrolysis, the Si deposit of different morphologies and photoresponse can be achieved. A dense Si film can be obtained by an elec-trolysis of a cell voltage from 2.4 to 2.6V or a current density of 3 to 7 mA cm-2. The photoresponse of the prepared dense Si film under 2.4V for 4 hours is ~ 4 mA cm-2. The use of a low-cost graphite substrate and SiO2 precursor to prepare different structured Si paves a facile and controllable way to cut the cost of the Si as well as eliminate the environmental pollution caused by producing photoresponsive Si in current industry.
||Planned: Stand-alone book in which only your symposium’s papers would appear (indicate title in comments section below)