|About this Abstract
||2018 TMS Annual Meeting & Exhibition
||Bulk Metallic Glasses XV
||Surface Properties of Thin Film Metallic Glasses Produced by Physical Vapor Deposition
||Tatiana Ștefanov, Harsha Vardhan R. Maraka, David J Browne
|On-Site Speaker (Planned)
||David J Browne
Thin film metallic glass (TFMG) is a new class of coating with unique characteristics, due partially to the absence of grains and therefore of grain boundaries. Certain alloys offer high thermal stability and hardness and offer the possibility of ultra-low roughness. Hence, with these properties, TFMGs have applications in many areas, ranging from structural or electrical to optical components.
This work involves the design and development of optimized metallic glass compositions for fabricating TFMG using physical vapor deposition (PVD) via magnetron sputtering. The targets for PVD, here 2-inch diameter targets with a thickness of 6 mm, have been synthesized by arc-melting and tilt casting. A number of alloy compositions were used including Cu51Zr42Al4Ti3 and Zr44Cu40Al8Ag8. The structure of films deposited on different silicon and glass substrates was investigated using x-ray diffraction. We measured the roughness of the thin films using optical profilometry and atomic force microscopy.
||Planned: Supplemental Proceedings volume