|About this Abstract
||Materials Science & Technology 2019
||Late News Poster Session
||P1-32; Plasma Arc Jet Oxidation of Vacuum Plasma Sprayed Hafnium Nitride
||Archana Loganathan, Cheng Zhang, Luiza Fontoura, Benjamin Boesl, Arvind Agarwal
|On-Site Speaker (Planned)
Ultra-high temperature ceramic (UHTC) hafnium nitride (HfN) is one of the important structural material with high melting point, good oxidation resistance, high hardness and electrical properties. In this study, free-standing hafnium nitride cermet was successfully synthesized by vacuum plasma spray technique. Microstructure, structure and hardness of as-sprayed and oxidized HfN was explored. Oxidation of the as-sprayed HfN was investigated using plasma arc jet exposure torch at around 3000 °C for 60 s. As-sprayed HfN survived 60 s of high temperature exposure by forming uniform and dense hafnium oxide (HfO2) scale on the surface. The thickness of oxide scale was ~65 µm and the oxide was adherent to HfN surface.