|About this Abstract
||2018 TMS Annual Meeting & Exhibition
||Surface Interactions in Materials
||Role of Amorphous Alumina Interlayer over Deposition of ZrN Thin Film on U-Mo Fuel for Nuclear Application
||Zhi-Gang Mei, Sumit Bhattacharya, Abdellatif Yacout
|On-Site Speaker (Planned)
Zirconium nitride (ZrN) are currently under investigation as a diffusion barrier for U-Mo dispersion fuel for future high-performance research reactors. It was found that the ZrN coating deposited by atomic layer deposition (ALD) not only showed signs of cracking right after the deposition process but spalled off with little external manipulation. Deposition of alumina interlayer in between ZrN coating and U-Mo substrate seemed to solve the problem of spallation. To understand the role of alumina interlayer on the deposition of ZrN coating on U-Mo, we studied the interfaces formed between the diffusion barrier coatings and U-Mo substrate using first-principles calculations. We predicted the atomic structure, bonding, and ideal work of adhesion of the interfaces formed between the diffusion barriers and U-Mo substrate. Our calculations show that ALD amorphous alumina coating does improve the bonding strength between the ZrN coating and the oxidized U-Mo surface when compared to direct ZrN coating.
||Planned: Supplemental Proceedings volume