About this Abstract |
Meeting |
2020 TMS Annual Meeting & Exhibition
|
Symposium
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Additive Manufacturing: Advanced Characterization with Synchrotron, Neutron, and In Situ Laboratory-scale Techniques
|
Presentation Title |
Utilization of Backscattered Electrons for Process Monitoring During Electron Beam Melting |
Author(s) |
Carolin Korner, Christopher Arnold, Christoph Breuning |
On-Site Speaker (Planned) |
Carolin Korner |
Abstract Scope |
During electron beam melting, demanding processing conditions such as high temperature, vacuum conditions and X-ray Radiation impede the continuous operation of standard process monitoring devices like light-optical camera systems. To overcome this deficit, detection of backscattered electrons is a highly promising approach. It delivers a signal, which is sensitive to variations of process parameters while the detector is unsusceptible to the harsh environmental conditions. A detection system for backscattered electrons is implemented in an in-house EBM system and used for the acquisition of electron optical images of the molten surfaces as well as for the record of the in-situ signal during melting. The data is correlated afterwards to the as-built specimens to demonstrate the high usability for process monitoring during EBM. |
Proceedings Inclusion? |
Planned: Supplemental Proceedings volume |