| About this Abstract |
| Meeting |
2010 TMS Annual Meeting & Exhibition
|
| Symposium
|
Processing Materials for Properties
|
| Presentation Title |
The Effect of Sputtering Parameters on the Phase Formation of Sputtered Tantalum |
| Author(s) |
Anahita A Navid, Andrea Hodge |
| On-Site Speaker (Planned) |
Anahita A Navid |
| Abstract Scope |
The phase transitions in magnetron sputtered Tantalum as a function of residual stress and internal plasma conditions are presented in this study. The formation of body centered cubic (BCC) and tetragonal tantalum was observed on films deposited on a Si substrate at pressures between 0.3 and 1.4 Pa. The results demonstrate the formation of BCC tantalum at a 0.7 Pa sputtering pressure at various power settings. However, any other sputtering pressure did not yield a BCC structure but rather mixed BCC/tetragonal or a tetragonal phase. The texture and residual stress of both BCC and tetragonal tantalum changed significantly with increasing pressure and film thickness. In addition, the effect of underlayer material on the corresponding phase formation will also be presented for various sputtering pressures. |
| Proceedings Inclusion? |
Definite: A CD-only volume |