|About this Abstract
||2016 TMS Annual Meeting & Exhibition
||Mechanical Behavior at the Nanoscale III
||W-20: Phase Transformation of Sub-Micrometer Shape Memory Alloys Thin Films Synthesized by Biased Target Ion Beam Deposition
||Huilong Hou, Reginald F. Hamilton
|On-Site Speaker (Planned)
This work characterizes the sub-micrometer NiTi shape memory alloy thin films synthesized by a recently-developed film technology, biased target ion beam deposition (BTIBD). BTIBD is well-suited for atomically engineering thin films by custom-designedly possessing a wide range of processing pressure, controlled adatoms energy, and remarked repeatability and uniformity. The customized synthesis parameters control the composition, thickness, columnar grain, as well as surface roughness of sub-micrometer thin films. Rapid thermal annealing can efficiently tailor the microstructure such as grain size and transformable phases of the thin films. Shape memory response can be characterized by monitoring the changes in substrate curvature, electrical resistivity, or surface topography during a cycle of temperature change. The ability of producing thickness-lower-than -state of the art NiTi thin film with uncompromised shape memory response enables the advancement of shape memory smart materials into low dimensional regime for two-dimensional fundamental research and novel small-scale planar technology applications.
||Planned: A print-only volume